Title :
Dynamic calibration of low range silicon pressure sensors
Author :
Zakrzewski, J. ; Wróbel, K.
Author_Institution :
Silesian Univ. of Technol., Gliwice, Poland
Abstract :
Two methods of dynamic calibration of the low pressure piezoresistive sensors are presented and related to each other. The first method consists in the generation of the standing waves in a tube of the length corresponding to the wave frequency. The change of the wave frequency allows to obtain step by step the whole frequency response of the sensor. The second method consists in the recording of the down-step time response of the sensor. The main difficulty of the method lies in obtaining the proper shape of the pressure drop. It has been found out that the inlet tube length is essential in obtaining the successful results. Comparison of the both methods shows the satisfactory agreement of the calibration results
Keywords :
calibration; elemental semiconductors; frequency response; microsensors; piezoresistive devices; pressure sensors; silicon; Helmholtz resonator; Si; down-step time response; dynamic calibration; frequency response; inlet tube length; low pressure piezoresistive sensors; low range silicon pressure sensors; micromechanical sensors; pressure drop shape; standing waves generation; wave frequency change; Calibration; Capacitive sensors; Electric shock; Frequency response; Piezoresistance; Pressure measurement; Pulse shaping methods; Resonant frequency; Shape; Silicon;
Conference_Titel :
Instrumentation and Measurement Technology Conference, 2001. IMTC 2001. Proceedings of the 18th IEEE
Conference_Location :
Budapest
Print_ISBN :
0-7803-6646-8
DOI :
10.1109/IMTC.2001.928868
