Title :
Photoluminescence dependence on heterointerface for MOCVD grown GaInNAs/GaAs QWs
Author :
Kawaguchi, M. ; Miyamoto, T. ; Gouardes, E. ; Kondo, T. ; Koyama, F. ; Iga, K.
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
We investigated the effect of the gas flow sequence of dimethylhydrazine (DMHy) at heterointerfaces on the optical quality of GaInNAs/GaAs grown by metalorganic chemical vapor deposition (MOCVD). We point out that the photoluminescence (PL) degradation of GaInNAs grown by MOCVD can be categorized into two types. One is the formation of a GaNAs layer at the interface which causes both an unexpected wavelength extension and degradation of crystal quality. Another is introduction of non-radiative centers by N incorporation itself. To overcome these degradation mechanisms, the insertion of GaInAs to the GaInNAs/GaAs heterointerface is proposed. A GaInAs intermediate layer (IML) suppresses GaNAs formation and improve the optical quality of GaInNAs QWs
Keywords :
III-V semiconductors; MOCVD coatings; gallium arsenide; indium compounds; nonradiative transitions; photoluminescence; semiconductor growth; semiconductor quantum wells; GaInAs intermediate layer; GaInNAs-GaAs; GaInNAs/GaAs quantum well; dimethylhydrazine; gas flow sequence; heterointerface; metalorganic chemical vapor deposition; nonradiative center; optical quality; photoluminescence; Degradation; Fluid flow; Gallium arsenide; Indium phosphide; Inductors; MOCVD; Optical buffering; Photoluminescence; Surface emitting lasers; Vertical cavity surface emitting lasers;
Conference_Titel :
Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On
Conference_Location :
Nara
Print_ISBN :
0-7803-6700-6
DOI :
10.1109/ICIPRM.2001.929210