DocumentCode :
1747973
Title :
Modeling and minimization of interconnect energy dissipation in nanometer technologies
Author :
Taylor, Clark N. ; Dey, Sujit ; Zhao, Yi
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA
fYear :
2001
fDate :
2001
Firstpage :
754
Lastpage :
757
Abstract :
As the technology sizes of semiconductor devices continue to decrease, the effect of nanometer technologies on interconnects, such as crosstalk glitches and timing variations, become more significant. In this paper, we study the effect of nanometer technologies on energy dissipation in interconnects. We propose a new power estimation technique which considers DSM effects, resulting in significantly more accurate energy dissipation estimates than transition-count based methods for on-chip interconnects. We also introduce an energy minimization technique which attempts to minimize large voltage swings across the cross-coupling capacitances between interconnects. Even though the number of transitions may increase, our method yields a decrease in power consumption of up to 50%.
Keywords :
VLSI; capacitance; crosstalk; integrated circuit interconnections; integrated circuit modelling; low-power electronics; nanotechnology; timing; DSM effects; cross-coupling capacitances; crosstalk glitches; deep submicron technologies; energy minimization technique; interconnect energy dissipation; nanometer technologies; on-chip interconnects; power estimation technique; timing variations; voltage swings; Capacitance; Crosstalk; Electronics industry; Energy consumption; Energy dissipation; Nanoscale devices; Permission; Semiconductor devices; Timing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2001. Proceedings
ISSN :
0738-100X
Print_ISBN :
1-58113-297-2
Type :
conf
DOI :
10.1109/DAC.2001.156237
Filename :
935606
Link To Document :
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