Title :
Modeling and minimization of interconnect energy dissipation in nanometer technologies
Author :
Taylor, Clark N. ; Dey, Sujit ; Zhao, Yi
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA
Abstract :
As the technology sizes of semiconductor devices continue to decrease, the effect of nanometer technologies on interconnects, such as crosstalk glitches and timing variations, become more significant. In this paper, we study the effect of nanometer technologies on energy dissipation in interconnects. We propose a new power estimation technique which considers DSM effects, resulting in significantly more accurate energy dissipation estimates than transition-count based methods for on-chip interconnects. We also introduce an energy minimization technique which attempts to minimize large voltage swings across the cross-coupling capacitances between interconnects. Even though the number of transitions may increase, our method yields a decrease in power consumption of up to 50%.
Keywords :
VLSI; capacitance; crosstalk; integrated circuit interconnections; integrated circuit modelling; low-power electronics; nanotechnology; timing; DSM effects; cross-coupling capacitances; crosstalk glitches; deep submicron technologies; energy minimization technique; interconnect energy dissipation; nanometer technologies; on-chip interconnects; power estimation technique; timing variations; voltage swings; Capacitance; Crosstalk; Electronics industry; Energy consumption; Energy dissipation; Nanoscale devices; Permission; Semiconductor devices; Timing; Voltage;
Conference_Titel :
Design Automation Conference, 2001. Proceedings
Print_ISBN :
1-58113-297-2
DOI :
10.1109/DAC.2001.156237