DocumentCode :
1749148
Title :
Dependence of temperature gradient on growth rate in CZ silicon
Author :
Natsume, A. ; Tanahashi, K. ; Inoue, Naoko ; Mori, A.
Author_Institution :
Res. Inst. for Adv. Sci. & Technol., Osaka Prefecture Univ., Japan
fYear :
2000
fDate :
2000
Firstpage :
303
Lastpage :
306
Abstract :
The dependence of temperature gradient in a CZ-Si crystal on the growth rate is examined by analyzing the experimental result where growth rate was solely varied without changing any other conditions. Unreported data are reproduced using the heat balance equation at the interface. It is shown that the temperature gradient increases linearly with the growth rate. The mechanism is discussed in terms of the heat flow and the interface shape
Keywords :
crystal growth from melt; elemental semiconductors; heat transfer; silicon; CZ silicon; CZ-Si crystal; Si; growth rate; heat flow; interface heat balance equation; interface shape; temperature gradient; Conductivity measurement; Crystals; Equations; Furnaces; Shape; Silicon; Solids; Temperature dependence; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
Conference_Location :
Canberra, ACT
Print_ISBN :
0-7803-5814-7
Type :
conf
DOI :
10.1109/SIM.2000.939248
Filename :
939248
Link To Document :
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