DocumentCode :
1749290
Title :
New method for nondestructive internal microtomography of IC and vacuum microelectronic devices
Author :
Li, Yawen ; Liang, Zhuguan ; Xiao, Ling ; Wang, Jian ; Zhou, Kailin ; Li, Ping ; Xu, Xiaohua ; Rau, E.I. ; Hu, Wenguo
Author_Institution :
Kunming Inst. of Phys., China
fYear :
2001
fDate :
2001
Firstpage :
15
Lastpage :
16
Abstract :
Summary form only given. We report some research results obtained using nondestructive internal microtomography (NDIMT) to study ICs and vacuum microelectronic devices (VMDs) in the SEM. We apply the method to detect the microstructure and defects in the subsurface of ICs and VMDs, which is a direct measure of their quality. By employing a special attachment devised for NDIMT to SEM, we can perform nondestructive internal microtomographic visualization of ICs and VMDs
Keywords :
electron tube testing; integrated circuit testing; nondestructive testing; scanning electron microscopy; tomography; vacuum microelectronics; IC; SF-AM; microtomographic visualization; nondestructive internal microtomography; subsurface defects; subsurface microstructures; vacuum microelectronic devices; Circuit testing; Detectors; Electrons; Gold; Integrated circuit testing; Joining processes; Microelectronics; OFDM modulation; Performance evaluation; Polymers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939630
Filename :
939630
Link To Document :
بازگشت