Study of field emission characteristics and surface compositions of carbon and silicon emitters utilizing scanning atom probe

Author

Nishikawa, O. ; Yagyu, T. ; Watanabe, M. ; Taniguchi, M. ; Murakami, T. ; Kondo, S.

Author_Institution

Dept. of Mater. Sci. & Eng., Kanazawa Inst. of Technol., Ishikawa, Japan

fYear

2001

fDate

2001

Firstpage

251

Lastpage

252

Abstract

The work function of carbon nanotubes (CNT) is found to be lower than that of other carbon specimens such as graphite and vitreous carbon and is lowered further by hydrogen adsorption. The work function increases by heating the CNT at 500°C for 60 min. Depth profiles of surface composition of Si etched by HF and NH₄F are studied with the scanning atom probe. Hydrogen concentrations in the etched silicon specimens are not uniform and many silicon atoms field evaporated from hydrogen rich areas are detected as Si_yH_x clusters which are dissociated in a few microseconds

Keywords

adsorption; atom probe field ion microscopy; carbon nanotubes; electron field emission; elemental semiconductors; etching; silicon; surface composition; work function; 500 C; C; H₂; HF; NH₄F; Si; carbon emitter; carbon nanotubes; depth profile; etching; field emission; field evaporation; graphite; hydrogen adsorption; hydrogen concentration; scanning atom probe; silicon emitter; surface composition; vitreous carbon; work function; Carbon dioxide; Etching; Hafnium; Hydrogen; Optical pulses; Probes; Silicon; Surface cleaning; Surface contamination; Surface emitting lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International

Conference_Location

Davis, CA

Print_ISBN

0-7803-7197-6

Type

conf

DOI

10.1109/IVMC.2001.939748

Filename

939748