DocumentCode
1749975
Title
Chemical-solution processing and patterning of integrated ferroelectrics
Author
Mikalsen, E.A. ; Payne, D.A. ; Clem, P.G.
Author_Institution
Dept. of Mater. Sci. & Eng., Illinois Univ., Urbana, IL, USA
Volume
1
fYear
2000
fDate
2000
Firstpage
5
Abstract
In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroelectric applications
Keywords
ferroelectric devices; ferroelectric thin films; chemical-solution processing; dense insulating layers; device structures; ferroelectric thin films; integrated ferroelectrics; patterning techniques; Chemical processes; Ferroelectric materials; Insulation; Laboratories; Lead compounds; Optical materials; Polarization; Residual stresses; Substrates; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location
Honolulu, HI
ISSN
1099-4734
Print_ISBN
0-7803-5940-2
Type
conf
DOI
10.1109/ISAF.2000.941502
Filename
941502
Link To Document