• DocumentCode
    1749992
  • Title

    Modeling the roles of oxygen vacancies in thin film ferroelectric memory

  • Author

    Lo, V.C. ; Chen, Z.J.

  • Author_Institution
    Dept. of Appl. Phys., Hong Kong Polytech. Univ., Kowloon, China
  • Volume
    1
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    157
  • Abstract
    The role of oxygen vacancies in thin ferroelectric film is modeled and the corresponding ferroelectric properties are numerically simulated using Ising Model. The octahedral cage of a perovskite cell is distorted in the presence of oxygen vacancy. Thus the originally symmetric potential for the titanium ion is now asymmetric due to the distortion. In the Monte Carlo simulation, the Hamiltonian of the dipole system is modified by this distorted potential. The latter also affects the probability of the flipping a dipole as well as the coupling between the neighboring dipoles. These oxygen vacancies are modeled to be randomly distributed at the electrode/film interfaces. Experimental results in frequency response, amplitude dependence, fatigue and distorted hysteresis loops are numerically reproduced
  • Keywords
    Ising model; Monte Carlo methods; dielectric hysteresis; ferroelectric storage; ferroelectric thin films; vacancies (crystal); Hamiltonian; Ising model; Monte Carlo simulation; amplitude dependence; dipole system; fatigue; frequency response; hysteresis loop; numerical simulation; oxygen vacancies; perovskite cell; thin film ferroelectric memory; Electrodes; Fatigue; Ferroelectric films; Ferroelectric materials; Hysteresis; Numerical simulation; Oxygen; Physics; Titanium; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    1099-4734
  • Print_ISBN
    0-7803-5940-2
  • Type

    conf

  • DOI
    10.1109/ISAF.2000.941532
  • Filename
    941532