DocumentCode
1749992
Title
Modeling the roles of oxygen vacancies in thin film ferroelectric memory
Author
Lo, V.C. ; Chen, Z.J.
Author_Institution
Dept. of Appl. Phys., Hong Kong Polytech. Univ., Kowloon, China
Volume
1
fYear
2000
fDate
2000
Firstpage
157
Abstract
The role of oxygen vacancies in thin ferroelectric film is modeled and the corresponding ferroelectric properties are numerically simulated using Ising Model. The octahedral cage of a perovskite cell is distorted in the presence of oxygen vacancy. Thus the originally symmetric potential for the titanium ion is now asymmetric due to the distortion. In the Monte Carlo simulation, the Hamiltonian of the dipole system is modified by this distorted potential. The latter also affects the probability of the flipping a dipole as well as the coupling between the neighboring dipoles. These oxygen vacancies are modeled to be randomly distributed at the electrode/film interfaces. Experimental results in frequency response, amplitude dependence, fatigue and distorted hysteresis loops are numerically reproduced
Keywords
Ising model; Monte Carlo methods; dielectric hysteresis; ferroelectric storage; ferroelectric thin films; vacancies (crystal); Hamiltonian; Ising model; Monte Carlo simulation; amplitude dependence; dipole system; fatigue; frequency response; hysteresis loop; numerical simulation; oxygen vacancies; perovskite cell; thin film ferroelectric memory; Electrodes; Fatigue; Ferroelectric films; Ferroelectric materials; Hysteresis; Numerical simulation; Oxygen; Physics; Titanium; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location
Honolulu, HI
ISSN
1099-4734
Print_ISBN
0-7803-5940-2
Type
conf
DOI
10.1109/ISAF.2000.941532
Filename
941532
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