Title :
Ferroelectric emission studies for electron emission lithography applications
Author :
Yoo, In K. ; Ryu, Sang O. ; Suchicital, Carlos ; Lee, June K. ; Kim, B.M. ; Chung, J.W.
Author_Institution :
Samsung Adv. Inst. of Technol., Suwon, South Korea
Abstract :
Ferroelectric switching emission, dielectric switching emission, and pyroelectric emission were studied by patterning images on electron resist for electron emission lithography applications. It was observed that the pyroelectric emission is most acceptable for a high throughput 1:1 electron projection lithography application. A 1:1 electron projection lithography was demonstrated by patterning images with line widths of 30 μm by utilizing pyroelectric emission. A degradation of the pyroelectric emission property of the material was observed during repeated heating cycles below the phase transition temperature of the ferroelectric material. Annealing excursions above the phase transition temperature prevented the degradation of the pyroelectric emitter
Keywords :
electron beam lithography; electron emission; ferroelectric materials; ferroelectric switching; pyroelectricity; 30 micron; electron emission lithography applications; electron resist; ferroelectric switching emission; high throughput electron projection lithography; patterning images; pyroelectric electron emission; Degradation; Dielectrics; Electron emission; Ferroelectric materials; Heating; Lithography; Pyroelectricity; Resists; Temperature; Throughput;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.941544
