Title :
Highly accelerated lifetime testing (HALT) of lead zirconate titanate (PZT) thin films
Author :
Polcawich, R.G. ; Feng, C. ; Vanatta, P. ; Piekarz, R. ; Trolier-McKinstry, S. ; Dubey, M. ; Ervin, M.
Author_Institution :
Gen. Tech. Services, Wall Township, NJ, USA
Abstract :
The lifetime of PZT films under dc field is relevant for both capacitive and electromechanical applications. To assess the factors controlling the lifetime, a series of highly accelerated lifetime tests (HALT) were performed on ~0.88 μm thick sol-gel PZT (52/48) thin films exposed to temperatures ranging from 100 °C to 180 °C and electric fields ranging from 284 to 455 kV/cm. Using a lognormal plot of failure times to represent the data, an S-shaped pattern, indicative of two failure modes, is observed. The later failures represent the limiting device lifetimes and these values that were used to compute lifetime prediction values. It was found that the activation energy for failure was ~1.1 eV and the voltage acceleration factor was ~5.3. Scanning electron microscopy analysis revealed that arc discharge is the most prominent failure mechanism during operation
Keywords :
arcs (electric); ceramic capacitors; failure analysis; ferroelectric capacitors; lead compounds; life testing; materials testing; piezoceramics; piezoelectric thin films; scanning electron microscopy; sol-gel processing; 0.88 micron; 1.1 eV; 100 to 180 C; HALT; PZT; PZT 52/48 thin films; PbZrO3TiO3; S-shaped pattern; activation energy for failure; arc discharge; capacitive applications; dc operating reliability; electric fields; electromechanical applications; failure mechanism; failure modes; failure times; highly accelerated lifetime tests; leakage current; limiting device lifetimes; lognormal plot; processing defects; scanning electron microscopy analysis; sol-gel PZT thin films; thin film dielectric reliability; voltage acceleration factor; Failure analysis; Life estimation; Life testing; Lifetime estimation; Performance evaluation; Temperature control; Temperature distribution; Thickness control; Transistors; Voltage;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.941571