DocumentCode
1751552
Title
Control design for a 6 DOF e-beam lithography stage
Author
Yang, Pai-Hsueh ; Alamo, Brian ; Andeen, Gerry B.
Author_Institution
Nikon Res. Corp. of America, Belmont, CA, USA
Volume
3
fYear
2001
fDate
2001
Firstpage
2255
Abstract
A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using linear feedback, acceleration feedforward, gravity compensation, repetitive control, and error prediction
Keywords
compensation; control system synthesis; electron beam lithography; feedforward; force control; motion control; position control; three-term control; 6 DOF e-beam lithography stage; acceleration feedforward; control design; control system requirements; error prediction; gravity compensation; high-resolution multiple-electron beam lithography; in-line wafer inspection; linear feedback; metrology system requirements; repetitive control; smooth predictable motion; Acceleration; Control design; Control engineering; Control systems; Error correction; Gravity; Inspection; Linear feedback control systems; Lithography; Metrology;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2001. Proceedings of the 2001
Conference_Location
Arlington, VA
ISSN
0743-1619
Print_ISBN
0-7803-6495-3
Type
conf
DOI
10.1109/ACC.2001.946086
Filename
946086
Link To Document