Evaluation of Si(Li) detectors by a combination of the copper staining method and X-ray analytical microscopy

Author

Kume, Hideyuki ; Onabe, Hideaki ; Obinata, Mitsugu ; Kashiwagi, Toshisuke

Author_Institution

Div. of Environ. Chem., Nat. Inst. of Environ. Studies, Ibaraki, Japan

Volume

1

fYear

2000

fDate

2000

Firstpage

36220

Abstract

We performed copper mapping for copper-stained lithium ion compensated, Si(Li), wafers by micro-beam X-ray fluorescence (μ-XRF) method. Positional distribution of copper across a cross section of the wafers treated at 120 C for 20 hours with no bias applied after complete compensation clearly showed deviation from those not given the thermal treatment. It was also found that surface barrier detectors fabricated from the so treated wafers exhibited better energy resolutions for both conversion electrons from ²⁰⁷Bi and particles from ²⁴¹Am. Correlation between performance of the Si(Li) detectors and lithium distribution in the intrinsic region was studied on the basis of the experimental results

Keywords

X-ray detection; X-ray fluorescence analysis; X-ray microscopy; copper; heat treatment; position sensitive particle detectors; silicon radiation detectors; 120 C; 20 h; ²⁰⁷Bi; ²⁴¹Am; Cu; Cu staining method; Si(Li) detectors; Si:Li; X-ray analytical microscopy; conversion electrons; micro-beam X-ray fluorescence; positional distribution; surface barrier detectors; thermal treatment; Atomic layer deposition; Copper; Electrons; Fluorescence; Lithium; Silicon; Surface treatment; X-ray detection; X-ray detectors; X-ray imaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Nuclear Science Symposium Conference Record, 2000 IEEE

Conference_Location

Lyon

ISSN

1082-3654

Print_ISBN

0-7803-6503-8

Type

conf

DOI

10.1109/NSSMIC.2000.949026

Filename

949026