DocumentCode
1752022
Title
A new technique for fabrication of a Gas Electron Multiplier
Author
Rehak, P. ; Smith, G.C. ; Warren, J.B. ; Yu, B.
Author_Institution
Instrum. Div., Brookhaven Nat. Lab., Upton, NY, USA
Volume
1
fYear
2000
fDate
2000
Abstract
The Gas Electron Multiplier (GEM) represents one of the most promising micro-pattern detectors for providing stable, charge multiplication over a wide range of active areas, and with genuinely affordable and reproducible fabrication methods. Several important characteristics of the GEM remain to be investigated and optimized. One key feature is the charging-up of the dielectric insulating layer of GEMs and its dependence on hole geometry. Using an epoxy-based photoresist, we are developing a fabrication technique that naturally generates purely cylindrical holes in the GEM electrode, a geometry that has been found by previous researchers to minimize or eliminate this effect. This report describes the principle of the fabrication technique and presents experimental results of energy resolution, gain, rate capability and potential for large area applications. These compare favorably with the attributes of existing techniques
Keywords
drift chambers; charge multiplication; dielectric insulating layer; energy resolution; epoxy-based photoresist; fabrication methods; fabrication technique; gain; gas electron multiplier; micro-pattern detectors; rate capability; Detectors; Dielectrics and electrical insulation; Electrodes; Electron multipliers; Energy resolution; Fabrication; Geometry; Instruments; Laboratories; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Nuclear Science Symposium Conference Record, 2000 IEEE
Conference_Location
Lyon
ISSN
1082-3654
Print_ISBN
0-7803-6503-8
Type
conf
DOI
10.1109/NSSMIC.2000.949081
Filename
949081
Link To Document