• DocumentCode
    1752022
  • Title

    A new technique for fabrication of a Gas Electron Multiplier

  • Author

    Rehak, P. ; Smith, G.C. ; Warren, J.B. ; Yu, B.

  • Author_Institution
    Instrum. Div., Brookhaven Nat. Lab., Upton, NY, USA
  • Volume
    1
  • fYear
    2000
  • fDate
    2000
  • Abstract
    The Gas Electron Multiplier (GEM) represents one of the most promising micro-pattern detectors for providing stable, charge multiplication over a wide range of active areas, and with genuinely affordable and reproducible fabrication methods. Several important characteristics of the GEM remain to be investigated and optimized. One key feature is the charging-up of the dielectric insulating layer of GEMs and its dependence on hole geometry. Using an epoxy-based photoresist, we are developing a fabrication technique that naturally generates purely cylindrical holes in the GEM electrode, a geometry that has been found by previous researchers to minimize or eliminate this effect. This report describes the principle of the fabrication technique and presents experimental results of energy resolution, gain, rate capability and potential for large area applications. These compare favorably with the attributes of existing techniques
  • Keywords
    drift chambers; charge multiplication; dielectric insulating layer; energy resolution; epoxy-based photoresist; fabrication methods; fabrication technique; gain; gas electron multiplier; micro-pattern detectors; rate capability; Detectors; Dielectrics and electrical insulation; Electrodes; Electron multipliers; Energy resolution; Fabrication; Geometry; Instruments; Laboratories; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium Conference Record, 2000 IEEE
  • Conference_Location
    Lyon
  • ISSN
    1082-3654
  • Print_ISBN
    0-7803-6503-8
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2000.949081
  • Filename
    949081