Title :
Electrical Behavior of Nano-scale Junctions with Well Engineered Double Stranded DNA Molecules
Author :
Mahapatro, Ajit K. ; Janes, David B. ; Jeong, Kyung J. ; Lee, Gil U.
Author_Institution :
School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN-47907, USA, e-mail: ajit@ecn.purdue.edu
Abstract :
The electrical conduction through polycation stabilized short (15 base-pairs, ~5.4nm) double standard (ds)-DNA molecules are measured at ambient. The metal-DNA interface properties are studied by functionalizing the DNA with a thiol group attachment at their 3’ and 5’ ends using different spacers. The thermodynamically stable ds-DNA strands are prepared from the single DNA chains and their complements in a phosphate buffer solution (PBS) and immobilized between isolated pairs of gold (Au) electrodes. Molecular scale gaps between contacts were formed by an electromigration technique performed on a lithographically defined Au micro-wire that is e-beam evaporated over oxidized silicon substrate using a molecular adhesion monolayer. The DNA strands are stabilized by exposing to a polycation environment (spermidine in PBS). In the 15 base-pair double strands, the conductivity is observed to change systematically with DNA sequence and end-group structure.
Keywords :
DNA conduction in ambient; Electromigration; Nano-gap; Oxidative damage; Polycation stabilization; Thiol functionalized Double standed (ds)-DNA; Adhesives; Conductivity; DNA; Electric variables measurement; Electrodes; Electromigration; Gold; Measurement standards; Sequences; Silicon; DNA conduction in ambient; Electromigration; Nano-gap; Oxidative damage; Polycation stabilization; Thiol functionalized Double standed (ds)-DNA;
Conference_Titel :
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN :
1-4244-0077-5
DOI :
10.1109/NANO.2006.247568