DocumentCode
1753225
Title
Optimization of Grating Coupler Efficiency for Nanophotonic Device Integration
Author
Masturzo, Scoft A. ; Rice, Jan M Yarrison ; Jackson, Howard E. ; Boyd, Joseph T.
Author_Institution
Department of Electrical & Computer Engineering and Computer Science, University of Cincinnati, Cincinnati, OH 45221
Volume
2
fYear
2006
fDate
17-20 June 2006
Firstpage
739
Lastpage
741
Abstract
A unique experimental apparatus has been developed for the optical characterization of nanophotonic devices. Grating couplers with nanoscale periodicity have been fabricated on silicon-on-insulator (SOI) substrates by electron beam lithography (EBL) and reactive ion etching (RIE). The coupling efficiency of these gratings has been measured as a function of grating depth and the angle and wavelength of incident radiation. A coupling efficiency of at least 5.2% is demonstrated for 1568 nm light incident at 40°.
Keywords
Electron beams; Electron optics; Etching; Gratings; Lithography; Nanoscale devices; Optical coupling; Optical devices; Particle beam optics; Silicon on insulator technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2006. IEEE-NANO 2006. Sixth IEEE Conference on
Print_ISBN
1-4244-0077-5
Type
conf
DOI
10.1109/NANO.2006.247761
Filename
1717211
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