Characterisation of Slow Light in a Waveguide Grating

Author

De Ridder, René M. ; Hopman, Wico C L ; Hoekstra, Hugo J W M

Author_Institution

Inst. for Nanotechnol., Twente Univ., Enschede

Volume

2

fYear

2006

fDate

18-22 June 2006

Firstpage

88

Lastpage

90

Abstract

A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520-1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q >10⁴ and a group velocity of <0.1 c

Keywords

Q-factor; diffraction gratings; integrated optics; light scattering; optical waveguides; photolithography; silicon compounds; 1520 to 1560 nm; Q-factor; Si₃N₄; conventional lithography; first Bloch-mode resonance; high-resolution camera; infrared camera; laser interference lithography; local out-of-plane scattered light; long-wavelength band edge; silicon nitride waveguide; slow light; transmission measurements; waveguide grating; Gratings; Interference; Lithography; Optical scattering; Optical waveguides; Resonance light scattering; Silicon; Slow light; Waveguide lasers; Wavelength measurement; Q-factor; photonic crystal; resonance; slow light measurement; waveguide grating;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2006 International Conference on

Conference_Location

Nottingham

Print_ISBN

1-4244-0235-2

Electronic_ISBN

1-4244-0236-0

Type

conf

DOI

10.1109/ICTON.2006.248344

Filename

4013740