Title :
Perspectives of CMOS technology from the viewpoint of variability
Author_Institution :
MIRAI-Selete, Japan
Abstract :
Presents a collection of slides covering the following topics: Variation is the most important issue for the Advanced CMOS & LSI´s; LWR and LER are main variation factors in FEOL; Absolute values of LWR/LER depend on process technology and DFM; We can improve LWR/LER and RDF, if understand the mechanisms correctly; Please try new process to improve LWR/LER and RDF.
Keywords :
CMOS integrated circuits; CMOS technology; DFM; FEOL; LER; LSI; LWR; absolute values; process technology; variability; CMOS integrated circuits; Logic gates; Resistance;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
