• DocumentCode
    1753963
  • Title

    Application and effect verification of EES to old generation resist coater

  • Author

    Shimojoh, Takahiro ; Shimbo, Masahiro

  • Author_Institution
    SANYO Semicond. Manuf. Co., Ltd., Ojiya, Japan
  • fYear
    2010
  • fDate
    18-20 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we discussed the possibility of application of EES (Equipment Engineering System) to old generation resist coater. We also showed the effectiveness of arranging log data to “Basic EE Data” proposed in Selete. We confirmed that the application of EES was effective not only in the latest equipment but also old generation one, and that “Basic EE Data” was able to reduce time and cost of the data analysis.
  • Keywords
    cost reduction; data analysis; formal verification; EES verification; basic EE data; data analysis; equipment engineering system; old generation resist coater;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2010 International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-0392-8
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5750232
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1753963