Title :
A novel electron beam-inspection technique for high-impedance contact plugs
Author :
Ominami, Yusuke ; Tsuno, N. ; Nozoe, M. ; Oh, J.H. ; Yoo, H.W. ; Lee, J.P. ; Mun, D.Y.
Author_Institution :
Hitachi High-Technol. Corp., Hitachinaka, Japan
Abstract :
We here present a novel electron beam inspection technique for non-annealed high impedance poly-Si plugs. At this new method, interval time between each electron beam scan is varied to enhance the difference of surface voltage of normal plug, disconnected plug and SiO2. Based on experimental results using our experimental tool with the new interval scan technique, contrast between SiO2 and poly-Si plug, between normal plug and disconnected plug have been dramatically enhanced.
Keywords :
electric connectors; electron beam applications; inspection; silicon compounds; SiO2; electron beam inspection technique; high-impedance contact plug; interval scan technique; Detectors; Electron beam applications; Surface treatment;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
