Title :
Parallel plate wet denuder coupled ion chromatography for near real time monitoring of acids, ammonia and amines in clean room and equipments
Author :
Takeuchi, Masaki ; Shiramizu, Yoshimi ; Tanaka, Masaru ; Tsunoda, Hiromichi ; Tanaka, Hideji ; Namiki, Norikazu ; Fujii, Shuji
Author_Institution :
Univ. of Tokushima, Tokushima, Japan
Abstract :
An automated acidic (HF, CH3COOH, HCOOH, HCl, HNO2, SO2, and HNO3) or basic (NH3, monoethanolamine, and N-methylethanolamine) gases monitoring system in cleanrooms and equipments is described. A parallel plate wet denuder (PPWD) collects gaseous contaminants at a higher sample flow rate compared to conventional methods. The samples collected with PPWD are continuously pumped into a concentration column, and determined by means of ion chromatography.
Keywords :
ammonia; chromatography; clean rooms; contamination; environmental monitoring (geophysics); pH; production equipment; semiconductor device manufacture; semiconductor industry; CH3COOH; HCOOH; HCl; HF; HNO2; HNO3; N-methylethanolamine; NH3; SO2; amines; ammonia; automated acidic gas; clean room; equipment; flow rate; gas monitoring system; gaseous contaminant; ion chromatography; monoethanolamine; parallel plate wet denuder; real time monitoring; Human computer interaction;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
