• DocumentCode
    1754179
  • Title

    Thermal isolation in 3D chip stacks using vacuum gaps and capacitive or inductive communications

  • Author

    Franzon, Paul ; Wilson, John ; Li, Ming

  • Author_Institution
    Rambus Inc., Chapel Hill, NC, USA
  • fYear
    2010
  • fDate
    16-18 Nov. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In a 3D chip stack, it is important to thermally isolate any DRAMs from high power processors, so that the former can operate at low junction temperatures. One way to do this is to use the combination of a vacuum gap, formed using standard semiconductor processing, together with capacitive or inductive signaling across the gap. Simulation shows that the DRAM can operate at a temperature 47°C cooler than the CPU.
  • Keywords
    Program processors; Random access memory; Semiconductor process modeling; 3D logic on memory; 3D-IC; 3DIC; TSV; Through Silicon Via; capacitive coupling; inductive coupling; thermal;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    3D Systems Integration Conference (3DIC), 2010 IEEE International
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4577-0526-7
  • Type

    conf

  • DOI
    10.1109/3DIC.2010.5751431
  • Filename
    5751431