DocumentCode :
1754179
Title :
Thermal isolation in 3D chip stacks using vacuum gaps and capacitive or inductive communications
Author :
Franzon, Paul ; Wilson, John ; Li, Ming
Author_Institution :
Rambus Inc., Chapel Hill, NC, USA
fYear :
2010
fDate :
16-18 Nov. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In a 3D chip stack, it is important to thermally isolate any DRAMs from high power processors, so that the former can operate at low junction temperatures. One way to do this is to use the combination of a vacuum gap, formed using standard semiconductor processing, together with capacitive or inductive signaling across the gap. Simulation shows that the DRAM can operate at a temperature 47°C cooler than the CPU.
Keywords :
Program processors; Random access memory; Semiconductor process modeling; 3D logic on memory; 3D-IC; 3DIC; TSV; Through Silicon Via; capacitive coupling; inductive coupling; thermal;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
3D Systems Integration Conference (3DIC), 2010 IEEE International
Conference_Location :
Munich
Print_ISBN :
978-1-4577-0526-7
Type :
conf
DOI :
10.1109/3DIC.2010.5751431
Filename :
5751431
Link To Document :
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