DocumentCode :
1754200
Title :
Development of high accuracy wafer thinning and pickup technology for thin wafer
Author :
Miyazaki, Chuichi ; Shimamoto, Haruo ; Uematsu, Toshihide ; Abe, Yoshiyuki ; Kitaichi, Kosuke ; Morifuji, Tadahiro ; Yasunaga, Shoji
fYear :
2010
fDate :
16-18 Nov. 2010
Firstpage :
1
Lastpage :
4
Abstract :
We have evaluated accurate wafer thinning and picking up die technology around 10? m thickness. We obtained the prospect that thickness accuracy 10±1? m which is the target of the ultra thin grinding, by applying new technology like non-contact gauge or Auto TTV. The thickness distribution of the wafer with the glass achieved the sample of TTV:2.9? m, and the thickness accuracy of a real wafer became TTV:0.4? m as a result of doing BG by using non-contact gauge the Auto TTV function. Targeted value TTV:1.4? m was able to be achieved. For picking up the ultra thin dies, we found the best tool design rule and some machine condition. In picking up the ultra thin dies, the amount of the overhang of the die to the width of the slider confirmed 0.3mm was the best. The peel property of the chip edge was improved by the tension to horizontal direction in enlarging the amount of the tape expansion and picking up was improved. In addition, the peel property of the chip edge improved by slowing down the slider speed when beginning.
Keywords :
grinding; integrated circuit manufacture; surface treatment; three-dimensional integrated circuits; die technology; high accuracy wafer thinning; pickup technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
3D Systems Integration Conference (3DIC), 2010 IEEE International
Conference_Location :
Munich
Print_ISBN :
978-1-4577-0526-7
Type :
conf
DOI :
10.1109/3DIC.2010.5751470
Filename :
5751470
Link To Document :
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