DocumentCode
1754855
Title
Optical Properties of GaAs/AlO
and Si/SiO
High Contrast Gratings Designed for 980-nm V
Author
Gebski, Marcin ; Dems, M. ; Jian Chen ; Qijie Wang ; Dao Hua Zhang ; Czyszanowski, T.
Author_Institution
Photonics Group, Lodz Univ. of Technol., Łodź, Poland
Volume
13
Issue
3
fYear
2014
fDate
41760
Firstpage
418
Lastpage
424
Abstract
A 3-D, fully vectorial optical numerical model is used to design a high contrast grating for use as the top mirror of a 980-nm arsenide-based vertical-cavity surface-emitting laser. We study the parameters of two high contrast gratings made from GaAs/AlOx and Si/SiOx, respectively. Parameters providing high degrees of reflectivity, high levels of polarization discrimination, and fine tuning of the reflectivity of the high contrast grating are determined. The results demonstrate that both configurations if carefully designed by advanced numerical models can offer better performance in comparison to conventional distributed Bragg reflectors.
Keywords
III-V semiconductors; aluminium compounds; diffraction gratings; elemental semiconductors; gallium arsenide; laser cavity resonators; laser mirrors; light polarisation; numerical analysis; reflectivity; semiconductor lasers; silicon; silicon compounds; surface emitting lasers; 3D fully vectorial optical numerical model; GaAs-AlOx; Si-SiOx; VCSEL; arsenide-based vertical-cavity surface-emitting laser; high contrast gratings; optical properties; polarization discrimination; reflectivity; top mirror; wavelength 980 nm; Gallium arsenide; Gratings; Mirrors; Reflectivity; Refractive index; Silicon; Vertical cavity surface emitting lasers; High contrast gratings (HCGs); numerical simulations; vertical-cavity surface-emitting lasers (VCSELs);
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2014.2304611
Filename
6731566
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