Title :
A Simple Passivation Technique for AlGaN/GaN Ultraviolet Schottky Barrier Photodetector
Author :
Han-Yin Liu ; Wei-Chou Hsu ; Bo-Yi Chou ; Yi-Hsuan Wang
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Abstract :
This letter demonstrates and investigates AlGaN/GaN ultraviolet photodetector (UV-PD) with a simple passivation process. The hydrogen peroxide (H2O2) oxidation technique is adopted to complete the passivation. The results of chemical analysis suggest that the Al and Ga dangling bonds react with the oxygen atoms. This passivation process effectively reduces the side-wall surface states, which also suppress the dark current to 11 pA. In addition, the photo response and the UV to visible rejection ratio of the PD with H2O2 passivation process are enhanced to 8.1×10-3 A/W and 2.3×103 when the PD is biased at -10 V. The noise equivalent power and the detectivity are determined to be 1.63×10-8 W and 1.33×108 cmHz0.5W-1. The simple passivation technique improves the AlGaN/GaN UV PD performances effectively.
Keywords :
III-V semiconductors; Schottky barriers; aluminium compounds; dangling bonds; gallium compounds; hydrogen compounds; nitrogen compounds; optical fabrication; oxidation; oxygen; passivation; photodetectors; spectrochemical analysis; surface states; ultraviolet spectra; visible spectra; AlGaN-GaN; AlGaN-GaN ultraviolet Schottky barrier photodetector; H2O2; aluminum dangling bonds; chemical analysis; current 11 pA; dark current suppression; gallium dangling bonds; hydrogen peroxide oxidation technique; hydrogen peroxide passivation technique; noise equivalent power; oxygen atoms; photoresponse; side-wall surface states; ultraviolet-visible rejection ratio; Aluminum gallium nitride; Dark current; Gallium nitride; Passivation; Photoconductivity; Photodetectors; ${rm H}_{2}{rm O}_{2}$; AlGaN/GaN; passivation; photodetector; ultraviolet;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2013.2290130