• DocumentCode
    1757965
  • Title

    Improvement in Field-Effect Mobility of Indium Zinc Oxide Transistor by Titanium Metal Reaction Method

  • Author

    Hyuk Ji ; Ah Young Hwang ; Chang Kyu Lee ; Pil Sang Yun ; Jong Uk Bae ; Kwon-Shik Park ; Jae Kyeong Jeong

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Inha Univ., Incheon, South Korea
  • Volume
    62
  • Issue
    4
  • fYear
    2015
  • fDate
    42095
  • Firstpage
    1195
  • Lastpage
    1199
  • Abstract
    This paper examined the effects of postdeposition annealing on the electrical properties of titanium-capped (TC) indium–zinc oxide (IZO) films and their IZO thin-film transistors. The TC IZO transistor oxidized at the temperature of 300 °C exhibited a high field-effect mobility of 61.0 cm ^{2} /Vs, low subthreshold gate swing of 110 mV/decade, V_{\\rm th} of −0.4 V, and high I_{{math\\rm{{\\scriptscriptstyle ON}}/math\\rm{{\\scriptscriptstyle OFF}}}} ratio of 2.3 \\times 10^{8} . In addition, the positive gate bias stress-induced stability of the TC IZO transistor was better than that of the control device without metal capping treatment. This was attributed to the scavenging effect of the loosely bonded oxygen species in the IZO semiconductor by titanium thermal oxidation.
  • Keywords
    annealing; field effect transistors; indium compounds; oxidation; semiconductor materials; semiconductor thin films; thin film transistors; titanium; zinc compounds; InZnO-Ti; control device; electrical properties; field-effect mobility; indium zinc oxide thin-film transistors; loosely bonded oxygen; positive gate bias stress-induced stability; postdeposition annealing effects; scavenging effect; subthreshold gate swing; temperature 300 degC; titanium metal reaction method; titanium thermal oxidation; titanium-capped indium-zinc oxide films; voltage -0.4 V; Educational institutions; Logic gates; Metals; Plasmas; Temperature; Thin film transistors; Indium zinc oxide (IZO); metal capping; mobility; oxygen-related defect; thin-film transistors (TFTs); thin-film transistors (TFTs).;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2406331
  • Filename
    7055917