DocumentCode
1757965
Title
Improvement in Field-Effect Mobility of Indium Zinc Oxide Transistor by Titanium Metal Reaction Method
Author
Hyuk Ji ; Ah Young Hwang ; Chang Kyu Lee ; Pil Sang Yun ; Jong Uk Bae ; Kwon-Shik Park ; Jae Kyeong Jeong
Author_Institution
Dept. of Mater. Sci. & Eng., Inha Univ., Incheon, South Korea
Volume
62
Issue
4
fYear
2015
fDate
42095
Firstpage
1195
Lastpage
1199
Abstract
This paper examined the effects of postdeposition annealing on the electrical properties of titanium-capped (TC) indium–zinc oxide (IZO) films and their IZO thin-film transistors. The TC IZO transistor oxidized at the temperature of 300 °C exhibited a high field-effect mobility of 61.0 cm
/Vs, low subthreshold gate swing of 110 mV/decade,
of −0.4 V, and high
ratio of
. In addition, the positive gate bias stress-induced stability of the TC IZO transistor was better than that of the control device without metal capping treatment. This was attributed to the scavenging effect of the loosely bonded oxygen species in the IZO semiconductor by titanium thermal oxidation.
Keywords
annealing; field effect transistors; indium compounds; oxidation; semiconductor materials; semiconductor thin films; thin film transistors; titanium; zinc compounds; InZnO-Ti; control device; electrical properties; field-effect mobility; indium zinc oxide thin-film transistors; loosely bonded oxygen; positive gate bias stress-induced stability; postdeposition annealing effects; scavenging effect; subthreshold gate swing; temperature 300 degC; titanium metal reaction method; titanium thermal oxidation; titanium-capped indium-zinc oxide films; voltage -0.4 V; Educational institutions; Logic gates; Metals; Plasmas; Temperature; Thin film transistors; Indium zinc oxide (IZO); metal capping; mobility; oxygen-related defect; thin-film transistors (TFTs); thin-film transistors (TFTs).;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2406331
Filename
7055917
Link To Document