Title :
Sensors Based on Radiation-Induced Diffusion of Silver in Germanium Selenide Glasses
Author :
Dandamudi, P. ; Kozicki, M.N. ; Barnaby, H.J. ; Gonzalez-Velo, Y. ; Mitkova, M. ; Holbert, K.E. ; Ailavajhala, M. ; Yu, Weimin
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Abstract :
In this study we demonstrate the potential radiation sensing capabilities of a metal-chalcogenide glass (ChG) device. The lateral device senses radiation-induced migration of Ag+ ions in germanium selenide glasses by measuring changes in electrical resistance between electrodes. These devices exhibit a high-resistance `OFF-state´ (~ 1012 Ω) before irradiation, but following irradiation with either 60Co gamma-rays or UV light, their resistance drops to a low-resistance `ON-state´ (~ 103 Ω). The devices have exhibited cyclical recovery with room temperature annealing of Ag doped ChG, which suggests potential use in reusable radiation sensor applications. Furthermore, the mechanisms of radiation-induced Ag/Ag+ transport and reactions in ChG are modeled using a finite element device simulator. The essential reactions captured by the simulator are radiation-induced carrier generation, combined with reduction/oxidation for both ionic and neutral Ag species in the chalcogenide film. The results provide strong qualitative evidence that finite element codes can simulate ionic transport reactions in the ChG and reveal plausible mechanisms for radiation-induced metal doping.
Keywords :
annealing; chalcogenide glasses; diffusion; electric resistance measurement; finite element analysis; germanium compounds; oxidation; radiation hardening (electronics); radiation monitoring; reduction (chemical); semiconductor counters; silver; 60Co gamma-rays; Ag; ChG device; GeSe2; UV light; chalcogenide film; chalcogenide glass device; cyclical recovery; electrical resistance; electrodes; finite element device simulator; ionic transport reaction simulation; lateral device; potential radiation sensing capability; radiation-induced carrier generation; radiation-induced diffusion; radiation-induced metal doping; reduction-oxidation; room temperature annealing; temperature 293 K to 298 K; Doping; Dosimetry; Electrical resistance measurement; Finite element analysis; Gamma-rays; Ionizing radiation sensors; Radiation effects; Sensors; Chalcogenide glass; TCAD modeling; UV and gamma rays; dosimetry; photodoping; reusable sensor;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2013.2285343