• DocumentCode
    1759747
  • Title

    The Influence of \\hbox {CeO}_{2} Nano-Dots Decoration on Substrates on Flux Pinning Strength in \\hbox </h1></div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author</span></div><div class='col-12 col-md-9 leftDirection leftAlign'><h2 class='mb-0 fw-semibold'>Lu Ji ; Xiaoxin Gao ; Deyong Ge ; Wei Xie ; Pei Wang ; Xinjie Zhao ; Zheng Wang ; Ming Zhang ; Xu Zhang ; Wei Li ; Feng Song ; Shaolin Yan</h2></div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author_Institution</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>Dept. of Electron., Nankai Univ., Tianjin, China</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Volume</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>23</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Issue</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>3</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fYear</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>2013</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fDate</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>41426</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Firstpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>8001505</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Lastpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>8001505</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Abstract</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>Nano-sized CeO<sub>2</sub> dots were deposited on (001) LaAlO<sub>3</sub> substrate by rf magnetron sputtering. After the processing of the artificial decoration defects on the substrate, 100-nm, 150-nm, 200-nm, and 400-nm-thick Tl<sub>2</sub>Ba<sub>2</sub>CaCu<sub>2</sub>O<sub>8</sub> (Tl-2212) thin films were grown on it, using dc magnetron sputtering and post annealing process. AFM images showed that the CeO<sub>2</sub> nano-dots were distributed well on the substrate surface with 70 nm in diameter and 5 nm in height, and the density of nano-dots was 25±3 dots/μm<sup>2</sup>. SEM images were used to observe the variations on film surface. Transport critical current density J<sub>c</sub> was measured both on Tl-2212 film with nano-dots decorated substrate and untreated single crystal LaAlO<sub>3</sub> substrate. From the results, J<sub>c</sub> values of Tl-2212 films with nano-dots decorated substrate were lifted significantly, and the pinning strength was improved on Tl-2212 films by nanostructure defects induced from nano-dots.</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Keywords</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>annealing; atomic force microscopy; barium compounds; calcium compounds; cerium compounds; critical current density (superconductivity); flux pinning; high-temperature superconductors; lanthanum compounds; nanofabrication; nanostructured materials; scanning electron microscopy; sputter deposition; superconducting thin films; thallium compounds; (001) LaAlO<sub>3</sub> single crystal substrates; AFM; CeO<sub>2</sub>; DC magnetron sputtering; LaAlO<sub>3</sub>; RF magnetron sputtering; SEM; Tl<sub>2</sub>Ba<sub>2</sub>CaCu<sub>2</sub>O<sub>8</sub>; annealing; artificial decoration defects; atomic force microscopy; ceria nanosized dots; flux pinning strength; nanostructure defects; scanning electron microscopy; size 100 nm to 400 nm; size 5 nm; size 70 nm; substrate decoration; thin films; transport critical current density; Films; High temperature superconductors; Radio frequency; Sputtering; Substrates; Surface morphology; Surface treatment; <formula formulatype=$hbox{CeO}_{2}$; Tl-2212; pinning center;

  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2012.2234186
  • Filename
    6384687
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1759747