مرکز منطقه ای اطلاع رساني علوم و فناوري - The Influence of <formula formulatype="inline"> <img src="/images/tex/20762.gif" alt="\\hbox {CeO}_{2}"> </formula> Nano-Dots Decoration on Substrates on Flux Pinning Strength in <formula formulatype="inline"> <img src="/images/tex/20763.gif" alt="\\hbox

Title :

The Influence of $\\hbox {CeO}_{2}$ Nano-Dots Decoration on Substrates on Flux Pinning Strength in $\\hbox </div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Lu Ji ; Xiaoxin Gao ; Deyong Ge ; Wei Xie ; Pei Wang ; Xinjie Zhao ; Zheng Wang ; Ming Zhang ; Xu Zhang ; Wei Li ; Feng Song ; Shaolin Yan</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author_Institution : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Dept. of Electron., Nankai Univ., Tianjin, China</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Volume : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>23</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Issue : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>3</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>fYear : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>2013</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>fDate : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>41426</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Firstpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>8001505</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Lastpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>8001505</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Abstract : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Nano-sized CeO<sub>2</sub> dots were deposited on (001) LaAlO<sub>3</sub> substrate by rf magnetron sputtering. After the processing of the artificial decoration defects on the substrate, 100-nm, 150-nm, 200-nm, and 400-nm-thick Tl<sub>2</sub>Ba<sub>2</sub>CaCu<sub>2</sub>O<sub>8</sub> (Tl-2212) thin films were grown on it, using dc magnetron sputtering and post annealing process. AFM images showed that the CeO<sub>2</sub> nano-dots were distributed well on the substrate surface with 70 nm in diameter and 5 nm in height, and the density of nano-dots was 25±3 dots/μm<sup>2</sup>. SEM images were used to observe the variations on film surface. Transport critical current density J<sub>c</sub> was measured both on Tl-2212 film with nano-dots decorated substrate and untreated single crystal LaAlO<sub>3</sub> substrate. From the results, J<sub>c</sub> values of Tl-2212 films with nano-dots decorated substrate were lifted significantly, and the pinning strength was improved on Tl-2212 films by nanostructure defects induced from nano-dots.</div> </div> <div class='row'> <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Keywords : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>annealing; atomic force microscopy; barium compounds; calcium compounds; cerium compounds; critical current density (superconductivity); flux pinning; high-temperature superconductors; lanthanum compounds; nanofabrication; nanostructured materials; scanning electron microscopy; sputter deposition; superconducting thin films; thallium compounds; (001) LaAlO<sub>3</sub> single crystal substrates; AFM; CeO<sub>2</sub>; DC magnetron sputtering; LaAlO<sub>3</sub>; RF magnetron sputtering; SEM; Tl<sub>2</sub>Ba<sub>2</sub>CaCu<sub>2</sub>O<sub>8</sub>; annealing; artificial decoration defects; atomic force microscopy; ceria nanosized dots; flux pinning strength; nanostructure defects; scanning electron microscopy; size 100 nm to 400 nm; size 5 nm; size 70 nm; substrate decoration; thin films; transport critical current density; Films; High temperature superconductors; Radio frequency; Sputtering; Substrates; Surface morphology; Surface treatment; <formula formulatype=$ $hbox{CeO}_{2}$; Tl-2212; pinning center;