DocumentCode :
1759754
Title :
Elucidating the origin of spurious modes in aluminum nitride microresonators using a 2-D finite-element model
Author :
Branch, Darren ; Wojciechowski, Kenneth ; Olsson, R.
Author_Institution :
Biosensors & Nanomater. Dept., Sandia Nat. Labs., Albuquerque, NM, USA
Volume :
61
Issue :
5
fYear :
2014
fDate :
41760
Firstpage :
729
Lastpage :
738
Abstract :
In this work, an approach has been developed to predict the location of large spurious modes in the resonant response of aluminum nitride (AlN) microelectromechanical systems (MEMS) resonators over a wide range of desired operating frequencies. This addresses significant challenges in the design of more complex AlN devices, namely the prediction and elimination of spurious modes in the resonance response. Using the finite element method (FEM), the dispersion curves at wavelengths ranging from 8 to 20 μm were computed. It was determined that the velocities of symmetric Lamb (S0) and high-order antisymmetric (A) modes overlap at specific wavelengths. A 2-D FEM analysis showed that both the S0 and higher order A modes are mutually excited at a common operating wavelength. From this analysis, the coupling-of-modes (COM) parameters were extracted and used to compute the P-matrix and S-parameters using a 6-port transmission matrix. The P-matrix simulation was able to predict the electrical response of the S0 and nearby spurious modes. This work identified specific wavelength regions where COM has limited accuracy because of mode conversion. In these regions, the reflection (κp) and transduction (ζp) parameters change rapidly.
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; finite element analysis; micromechanical resonators; wide band gap semiconductors; 2D finite element method; AlN; MEMS resonators; P-matrix computation; S-parameter computation; dispersion curve; high order antisymmetric modes; microelectromechanical system; microresonator spurious modes; six-port transmission matrix; symmetric Lamb; wavelength 8 mum to 20 mum; Capacitance; Computational modeling; Dispersion; Electrodes; Finite element analysis; III-V semiconductor materials; Microcavities;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/TUFFC.2014.2965
Filename :
6805687
Link To Document :
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