SPR properties of 2D ZnO nano-holes fabricated by laser interference lithography

Author

Kim, S.H. ; Kim, D.G. ; Lee, B.H. ; Kim, Tae Un ; Ki, Hyun Chul ; Kim, H.J. ; Choi, Y.W. ; Lee, Byung-Tak

Author_Institution

Dept. of Mater. Sci. & Eng., Chonnam Nat. Univ., Gwangju, South Korea

Volume

49

Issue

8

fYear

2013

fDate

April 11 2013

Firstpage

551

Lastpage

552

Abstract

ZnO nanostructures are proposed to enhance the performance of surface plasmon resonance (SPR). The ZnO nanostructures on a 50 nm-thick Au thin-film are composed of nano-holes with a period of 300 nm. The ZnO nano-holes coupled SPR was simulated using the three-dimensionanl finite-difference time-domain method. The ZnO nano-holes have been fabricated by a laser interference lithography and wet etching process. The measured resonance angle of 47.5° was obtained; this agreed well with the simulated result. In comparison with the author´s previous report, the figure of merit of ZnO nano-holes coupled SPR was two times higher than that of the ZnO grating structure.

Keywords

II-VI semiconductors; etching; finite difference time-domain analysis; laser materials processing; nanofabrication; nanolithography; nanostructured materials; semiconductor growth; surface plasmon resonance; wide band gap semiconductors; zinc compounds; 2D nanoholes; Au; Au thin-film; SPR properties; ZnO; figure of merit; grating structure; laser interference lithography; size 50 nm; surface plasmon resonance; three-dimensionanl finite-difference time-domain method; wet etching;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el.2013.0574

Filename

6527554