Title :
Propagation of a Dielectric Barrier Discharge in a Multichannel Mixing Chip Microreactor
Author :
Stauss, Sven ; Ishii, Chikako ; Kuribara, Koichi ; Urabe, Keiichiro ; Terashima, K.
Author_Institution :
Dept. of Adv. Mater. Sci., Univ. of Tokyo, Kashiwa, Japan
Abstract :
An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.
Keywords :
argon; dielectric-barrier discharges; microreactors; plasma diagnostics; plasma materials processing; Ar; T-type mixing multichannel chip microreactor; argon; atmospheric-pressure dielectric barrier discharge; current-voltage measurements; dielectric barrier discharge propagation; frequency 10 kHz; gas flows; microchannel geometry; multichannel mixing chip microreactor; pressure 1 atm; time-resolved imaging; voltage 3.0 kV; Dielectrics; Discharges (electric); Electrodes; Geometry; Inductors; Microchannel; Plasmas; Atmospheric-pressure plasmas; current-voltage characteristics; dielectric barrier discharge; plasma microreactor; plasma sources; time-resolved imaging; time-resolved imaging.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2334496
