Propagation of a Dielectric Barrier Discharge in a Multichannel Mixing Chip Microreactor

Author

Stauss, Sven ; Ishii, Chikako ; Kuribara, Koichi ; Urabe, Keiichiro ; Terashima, K.

Author_Institution

Dept. of Adv. Mater. Sci., Univ. of Tokyo, Kashiwa, Japan

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

2358

Lastpage

2359

Abstract

An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.

Keywords

argon; dielectric-barrier discharges; microreactors; plasma diagnostics; plasma materials processing; Ar; T-type mixing multichannel chip microreactor; argon; atmospheric-pressure dielectric barrier discharge; current-voltage measurements; dielectric barrier discharge propagation; frequency 10 kHz; gas flows; microchannel geometry; multichannel mixing chip microreactor; pressure 1 atm; time-resolved imaging; voltage 3.0 kV; Dielectrics; Discharges (electric); Electrodes; Geometry; Inductors; Microchannel; Plasmas; Atmospheric-pressure plasmas; current-voltage characteristics; dielectric barrier discharge; plasma microreactor; plasma sources; time-resolved imaging; time-resolved imaging.;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2334496

Filename

6856210