• DocumentCode
    1762342
  • Title

    Ion Implantation-Based Edge Termination to Improve III-N APD Reliability and Performance

  • Author

    Suvarna, Puneet ; Bulmer, John ; Leathersich, Jeffrey M. ; Marini, Jonathan ; Mahaboob, Isra ; Hennessy, John ; Bell, L. Douglas ; Nikzad, Shouleh ; Shahedipour-Sandvik, F. Shadi

  • Author_Institution
    Coll. of Nanoscale Sci. & Eng., State Univ. of New York, Albany, NY, USA
  • Volume
    27
  • Issue
    5
  • fYear
    2015
  • fDate
    March1, 1 2015
  • Firstpage
    498
  • Lastpage
    501
  • Abstract
    We report on the development of ion implantationbased contact-edge termination technique to improve the reliability and performance of p-i-n and p-i-n-i-n GaN ultraviolet avalanche photodiode structures. The GaN photodiode structures were grown on sapphire substrates and implanted along the edge of the p-contact. The implanted devices show an absence of premature breakdown and demonstrate a lower dark-current with reliable ultraviolet photoresponse, compared with the standard unimplanted devices. Device simulations of the implanted structures at the breakdown voltage, show a reduction in crowding and spiking of the electric field along the perimeter of the contact by a factor of ~7, compared with the unimplanted structures.
  • Keywords
    III-V semiconductors; avalanche photodiodes; dark conductivity; gallium compounds; ion implantation; optical fabrication; optical materials; p-i-n photodiodes; sapphire; GaN; GaN photodiode structures; III-N APD performance; III-N APD reliability; breakdown voltage; dark-current; device simulations; electric field crowding; electric field spiking; ion implantation-based contact-edge termination technique; ion implantation-based edge termination; p-contact; p-i-n GaN ultraviolet avalanche photodiode structures; p-i-n-i-n GaN ultraviolet avalanche photodiode structures; premature breakdown; reliable ultraviolet photoresponse; sapphire substrates; standard unimplanted devices; Electric breakdown; Electric fields; Gallium nitride; PIN photodiodes; Standards; Substrates; APD; GaN; avalanche; device simulation; edge termination; photodiode; premature breakdown; reliability; ultraviolet detector;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2014.2382611
  • Filename
    6990561