• DocumentCode
    1762558
  • Title

    Lateral p-n-p Transistors and Complementary SiC Bipolar Technology

  • Author

    Lanni, Luigia ; Malm, B. Gunnar ; Ostling, Mikael ; Zetterling, Carl-Mikael

  • Author_Institution
    Sch. of Inf. & Commun. Technol., KTH R. Inst. of Technol., Kista, Sweden
  • Volume
    35
  • Issue
    4
  • fYear
    2014
  • fDate
    41730
  • Firstpage
    428
  • Lastpage
    430
  • Abstract
    Lateral p-n-p transistors and a complementary bipolar technology have been demonstrated for analog integrated circuits. Besides vertical n-p-n´s, this technology provides lateral p-n-p´s at the cost of one additional lithographic and dry etching step. Both devices share the same epitaxial layers and feature topside contacts to all terminals. The influence on p-n-p current gain of contact topology (circular versus rectangular), effective base width, base/emitter doping ratio, and temperature was studied in detail. In the range -40°C to 300 °C, the current gain of the p-n-p transistor shows a maximum of ~ 37 around 0 °C and decreases to ~ 8 at 300 °C, whereas in the same range, the gain of n-p-n transistors exhibits a negative temperature coefficient.
  • Keywords
    bipolar transistors; epitaxial layers; etching; lithography; silicon compounds; wide band gap semiconductors; SiC; analog integrated circuits; base-emitter doping ratio; complementary bipolar technology; contact topology; current gain temperature dependence; dry etching; epitaxial layers; lateral p-n-p transistors; lithography; negative temperature coefficient; temperature -40 degC to 300 degC; topside contacts; Current measurement; Doping; Epitaxial layers; Silicon carbide; Temperature dependence; Topology; Transistors; Bipolar junction transistor (BJT); complementary bipolar; current gain temperature dependence; high and low temperature; lateral PNP transistor; silicon carbide (SiC);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2303395
  • Filename
    6737263