Title :
Proton Irradiation Enhancement of Low-Field Negative Magnetoresistance Sensitivity of AlGaN/GaN-Based Magnetic Sensor at Cryogenic Temperature
Author :
Abderrahmane, Abdelkader ; Pil Ju Ko ; Okada, H. ; Sato, Shin-ichiro ; Ohshima, T. ; Sandhu, A.
Author_Institution :
Dept. of Electr. & Electron. Inf. Eng., Toyohashi Univ. of Technol., Toyohashi, Japan
Abstract :
The longitudinal and transverse magnetoresistances of AlGaN/GaN heterostructure-based micro-Hall sensors were compared with samples irradiated with protons with an energy of 380 keV and fluence of 1014 (protons/cm2). Increases in the elastic and inelastic scattering were deduced from weak localization behavior in both samples. The AlGaN/GaN micro-Hall sensors showed stable magnetic sensitivity in non and irradiated samples and increased resistivity after proton irradiation yielded an enhanced magnetoresistance sensitivity in nonirradiated sensors from 160 to 417 VA-1T-1. The minimum detectable magnetic field of irradiated micro-Hall sensors determined from magneto-voltage measurements at ~4 K was similar to the minimum detectable magnetic field in the nonirradiated sensors.
Keywords :
Hall effect transducers; III-V semiconductors; aluminium compounds; cryogenics; electromagnetic wave scattering; gallium compounds; magnetic field measurement; magnetic sensors; magnetoresistance; microsensors; voltage measurement; wide band gap semiconductors; AlGaN-GaN; cryogenic temperature; elastic scattering; electron volt energy 380 keV; heterostructure-based microHall sensor; inelastic scattering; irradiated microHall sensor; longitudinal magnetoresistance; low-field negative magnetoresistance sensitivity; magnetic field sensor; magnetovoltage measurement; proton irradiation enhancement; transverse magnetoresistance; weak localization behavior; Magnetic sensors; Magnetoelectric effects; Protons; Radiation effects; Sensitivity; Temperature sensors; AlGaN/GaN heterostructures; magnetoresistance; magnetoresistance.; micro-Hall sensors; proton irradiation; two-dimensional electron gas; weak localization;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2014.2358613