DocumentCode :
1764722
Title :
Phenomenological Compact Model for QM Charge Centroid in Multigate FETs
Author :
Venugopalan, Sarad ; Karim, M.A. ; Salahuddin, Sania ; Niknejad, Ali M. ; Hu, Chenming Calvin
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, Berkeley, CA, USA
Volume :
60
Issue :
4
fYear :
2013
fDate :
41365
Firstpage :
1480
Lastpage :
1484
Abstract :
We present a phenomenological compact model of the inversion charge centroid considering both the structural and electrical confinements in multigate FETs. The developed new model shows a good match with Technology-CAD (TCAD) data for both physical parameters such as fin thickness in FinFET and wire radius in cylindrical FET, channel doping, and electrical bias variation. With the introduction of fitting parameters, the model is capable of handling hole and electron carriers, various channel materials, and process variations, such as fin shape, etc.
Keywords :
MOSFET; doping; semiconductor device models; technology CAD (electronics); FinFET; TCAD data; channel doping; cylindrical FET; electrical bias variation; electrical confinements; fin thickness; fitting parameters; inversion charge centroid; multigate FET; phenomenological compact model; physical parameters; quantum-mechanical charge centroid; structural confinements; technology-CAD data; wire radius; Capacitance; Doping; Field effect transistors; Logic gates; Mathematical model; Semiconductor device modeling; Semiconductor process modeling; BSIM-CMG; FinFET; charge centroid; cylindrical gate (CG); double gate (DG); effective oxide capacitance; gate-all-around FET; multigate; nanowire FET; quantum–mechanical (QM) effects; surround gate; trigate;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2245419
Filename :
6482675
Link To Document :
بازگشت