• DocumentCode
    1764769
  • Title

    Bandgap Control for Intersubband Transition in InGaAs/AlAsSb Coupled Double Quantum Wells

  • Author

    Jijun Feng ; Akimoto, Ryoichi ; Gozu, Shin-ichiro ; Mozume, Teruo ; Hasama, Toshifumi ; Ishikawa, Hiroshi

  • Author_Institution
    Network Photonics Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
  • Volume
    25
  • Issue
    15
  • fYear
    2013
  • fDate
    Aug.1, 2013
  • Firstpage
    1474
  • Lastpage
    1477
  • Abstract
    This letter demonstrates bandgap control of ion-induced intermixing on InGaAs/AlAsSb coupled double quantum wells (CDQWs). With phosphorus ion implantation and different rapid thermal annealing (RTA) processes, the blueshift of the bandgap profile can be tailored. The influence of quantum well intermixing on the cross-phase modulation (XPM), caused by the intersubband transition in the CDQWs, is also experimentally investigated. Higher RTA temperature or longer annealing time could cause a larger bandgap blueshift that decreases the XPM efficiency. After annealing, the implanted CDQWs have a relatively low transmission loss, whereas the non-implanted sample can maintain a high XPM efficiency. This result can be used for monolithic integration of different bandgap modules with spatially selective mannerisms, and the implications are vast for optical communication applications.
  • Keywords
    III-V semiconductors; aluminium compounds; energy gap; gallium arsenide; indium compounds; ion implantation; optical materials; optical modulation; phase modulation; phosphorus; rapid thermal annealing; semiconductor quantum wells; spectral line shift; CDQW; InGaAs-AlAsSb; RTA; XPM; annealing; bandgap control; bandgap modules; blueshift; coupled double quantum wells; cross-phase modulation; intersubband transition; ion-induced intermixing; phosphorus ion implantation; quantum well intermixing; rapid thermal annealing; transmission loss; Quantum well intermixing; intersubband transition; rapid thermal annealing;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2013.2267774
  • Filename
    6530607