Title : 
Compact Dense Wavelength-Division (De)multiplexer Utilizing a Bidirectional Arrayed-Waveguide Grating Integrated With a Mach–Zehnder Interferometer
         
        
            Author : 
Sitao Chen ; Xin Fu ; Jian Wang ; Yaocheng Shi ; Sailing He ; Daoxin Dai
         
        
            Author_Institution : 
State Key Lab. for Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
         
        
        
        
        
        
        
        
            Abstract : 
A compact wavelength-division (de)multiplexer is proposed and demonstrated experimentally to achieve doubled channel number and halved channel spacing by utilizing a bidirectional arrayed-waveguide grating integrated with an Mach-Zehnder interferometer optical interleaver. As an example, an 18-channel wavelength-division (de)multiplexer with a channel spacing of 200 GHz is designed and fabricated. The measured excess loss is about 8 dB and the channel crosstalk is -15 ~ -18 dB. The footprint of this fabricated (de)multiplexer is about 520 μm × 190 μm.
         
        
            Keywords : 
Mach-Zehnder interferometers; arrayed waveguide gratings; channel spacing; demultiplexing equipment; integrated optoelectronics; multiplexing equipment; optical communication equipment; optical crosstalk; optical design techniques; optical fabrication; optical losses; wavelength division multiplexing; 18-channel wavelength-division demultiplexer; 18-channel wavelength-division multiplexer; Mach-Zehnder Interferometer; Mach-Zehnder interferometer optical interleaver; bidirectional arrayed-waveguide grating; channel crosstalk; channel spacing; compact dense wavelength-division multiplexer; doubled channel number; Arrayed waveguide gratings; Bidirectional control; Channel spacing; Optical device fabrication; Wavelength division multiplexing; Wavelength measurement; Arrayed-waveguide grating (AWG); arrayed-waveguide grating (AWG; bi-directional; interleaver; silicon nanowire;
         
        
        
            Journal_Title : 
Lightwave Technology, Journal of
         
        
        
        
        
            DOI : 
10.1109/JLT.2015.2405510