Title :
Free-standing aluminium nanowire arrays for high-transmission plasmonic colour filters
Author :
Honma, Hiroaki ; Takahashi, Koichi ; Fukuhara, Masashi ; Ishida, Makoto ; Sawada, Kazuaki
Author_Institution :
Dept. of Electr. & Electron. Inf. Eng., Toyohashi Univ. of Technol., Toyohashi, Japan
Abstract :
Presented is a fabrication process for the transmission of red-green-blue (RGB) colour filters based on surface plasmons (SPs) using aluminium (Al) nanowire arrays patterned through electron-beam lithography and the lift-off technique. An array of Al nanowires was deployed over a through hole formed by sacrificial silicon etching. The period of the Al nanowire arrays is the dominant structural parameter in determining the transmission peak position of SPs for a given material configuration. The Al nanowire arrays are designed with the same Al wire width under the assumption of operation using a microelectromechanical systems (MEMS) comb-drive actuator for the realisation of an RGB tunable colour filter. The peak wavelength of the transmitted light was red-shifted by increasing the period of the Al nanowire arrays from 450 to 600 nm, and RGB colours were demonstrated. A black pixel was produced using the 400 nm pitch Al nanowire array. The maximum measured transmittance of the peak wavelength was 56%. In addition, the number of nanowires sufficient for low-power operation by a MEMS comb-drive actuator was investigated and sufficient transmission light intensity was obtained from the pixel size of 10 μm2, including 20 Al nanowires.
Keywords :
aluminium; electron beam lithography; elemental semiconductors; etching; microactuators; nanofabrication; nanolithography; nanopatterning; nanophotonics; nanowires; optical design techniques; optical fabrication; optical filters; plasmonics; red shift; silicon; spectral line intensity; surface plasmons; visible spectra; Al; MEMS comb-drive actuator; RGB tunable colour filter; Si; black pixel; electron-beam lithography; free-standing aluminium nanowire arrays; high-transmission plasmonic color filters; lift-off technique; low-power operation; material configuration; maximum measured transmittance; microelectromechanical systems; pixel size; red-green-blue colour filters; red-shift; sacrificial silicon etching; structural parameter; surface plasmons; transmission light intensity; transmission peak position; transmitted light peak wavelength;
Journal_Title :
Micro & Nano Letters, IET
DOI :
10.1049/mnl.2014.0423