DocumentCode
1765561
Title
A Unified Framework for Outlier Detection in Trace Data Analysis
Author
Zhiguo Li ; Baseman, Robert J. ; Zhu, Yujia ; Tipu, Fateh A. ; Slonim, Noam ; Shpigelman, Lavi
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
27
Issue
1
fYear
2014
fDate
Feb. 2014
Firstpage
95
Lastpage
103
Abstract
Process trace data (PTD) is an important data type in semiconductor manufacturing and has a very large aggregate volume. While data mining and statistical analysis play a key role in the quality control of wafers, the existence of outliers adversely affects the applications benefiting from PTD analysis. Due to the complexities of PTD and the resultant outlier patterns, this paper proposes a unified outlier detection framework which takes advantages of data complexity reduction using entropy and abrupt change detection using cumulative sum (CUSUM) method. To meet the practical needs of PTD analysis, a two-step algorithm taking into account of the related domain knowledge is developed, and its effectiveness is validated by using real PTD sets and a production example. The experimental results show that the proposed method outperforms the Fast Greedy Algorithm (FGA) and the Grubb´s test, two commonly used outlier detection techniques for univariate data.
Keywords
data analysis; greedy algorithms; semiconductor process modelling; statistical analysis; CUSUM method; FGA; Grubb test; PTD analysis; cumulative sum method; data complexity reduction; data mining; entropy; fast greedy algorithm; outlier detection technique; process trace data analysis; quality control; semiconductor manufacturing; statistical analysis; unified outlier detection framework; CUSUM; Outlier detection; entropy; information content; process trace data;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2013.2267937
Filename
6530702
Link To Document