• DocumentCode
    1765738
  • Title

    An Explicit Surface-Potential-Based Model for Amorphous IGZO Thin-Film Transistors Including Both Tail and Deep States

  • Author

    Wanling Deng ; Junkai Huang ; Xiaoyu Ma ; Tao Ning

  • Author_Institution
    Dept. of Electron. Eng., Jinan Univ., Guangzhou, China
  • Volume
    35
  • Issue
    1
  • fYear
    2014
  • fDate
    Jan. 2014
  • Firstpage
    78
  • Lastpage
    80
  • Abstract
    A compact drain current model of amorphous In-Ga-Zn-O thin-film transistors based on terms of surface potential is presented in this letter. An explicit and closed-form scheme for the surface potential calculation is developed by including both exponential deep and tail states. With the effective charge density approach, the resulting dc and surface potential models give accurate descriptions with single-piece formulas, which are suitable for CAD applications. The proposed models are verified by both the numerical simulation and experimental result, and a good agreement is achieved over a wide range of operation regions.
  • Keywords
    II-VI semiconductors; amorphous semiconductors; gallium compounds; indium compounds; semiconductor device models; surface potential; thin film transistors; wide band gap semiconductors; zinc compounds; CAD applications; In-Ga-Zn-O; amorphous thin-film transistors; charge density approach; closed-form scheme; compact drain current model; dc models; deep states; explicit surface-potential-based model; tail states; Electric potential; Logic gates; Numerical models; Solid modeling; Thin film transistors; Amorphous IGZO thin film transistor; drain current model; surface potential;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2289877
  • Filename
    6671368