DocumentCode :
1766741
Title :
Lateral and Vertical Transistors Using the AlGaN/GaN Heterostructure
Author :
Chowdhury, Shuvro ; Mishra, Umesh K.
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
60
Issue :
10
fYear :
2013
fDate :
Oct. 2013
Firstpage :
3060
Lastpage :
3066
Abstract :
Power conversion losses are endemic in all areas of electricity consumption, including motion control, lighting, air conditioning, and information technology. Si, the workhorse of the industry, has reached its material limits. Increasingly, the lateral AlGaN/GaN HEMT based on gallium nitride (GaN-on-Si) is becoming the device of choice for medium power electronics as it enables high-power conversion efficiency and reduced form factor at attractive pricing for wide market penetration. The reduced form factor enabled by high-efficiency operation at high frequency further enables significant system price reduction because of savings in bulky extensive passive elements and heat sink costs. The high-power market, however, still remains unaddressed by lateral GaN devices. The current and voltage demand for high power conversion application makes the chip area in a lateral topology so large that it becomes more difficult to manufacture. Vertical GaN devices would play a big role alongside of silicon carbide (SiC) to address the high power conversion needs. In this paper, the development, performance, and status of lateral and vertical GaN devices are discussed.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; power conversion; silicon compounds; wide band gap semiconductors; AlGaN-GaN; HEMT; SiC; air conditioning; bulky extensive passive elements; electricity consumption; heat sink costs; high-power conversion efficiency; information technology; lateral transistor devices; lighting; medium power electronics; motion control; power conversion losses; reduced form factor; system price reduction; vertical transistor devices; Aluminum gallium nitride; Apertures; Gallium nitride; HEMTs; Logic gates; Silicon; Gallium nitride (GaN); lateral transistors; vertical transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2277893
Filename :
6587757
Link To Document :
بازگشت