DocumentCode :
1766969
Title :
Micromachined coplanar waveguide band-pass filter for w-band applications
Author :
Neculoiu, Dan ; Bunea, Alina-Cristina
Author_Institution :
IMT Bucharest, Bucharest, Romania
fYear :
2014
fDate :
6-9 Oct. 2014
Firstpage :
1230
Lastpage :
1233
Abstract :
In this paper we present the design and measurements for a novel configuration of a membrane supported coplanar waveguide band-pass filter for W band applications. The topology is based on identical symmetrical elementary cells connected in cascade. The design process is based on the image impedance representation and a full-wave 3D electromagnetic (EM) model is developed. A two-cell test structure was fabricated through silicon micromachining. The measured pass-band is of 28 %, centered around 91.5 GHz. The measured losses are of 3.77 dB at the central frequency and the reflection losses go down to -20 dB, in good agreement with the simulated results. This structure was designed to be easily adapted to the BiCMOS technology with localized back-side etch (LBE) process.
Keywords :
band-pass filters; coplanar waveguides; micromachining; millimetre wave filters; waveguide filters; BiCMOS technology; EM model; LBE process; W-band applications; design process; full-wave 3D electromagnetic model; identical symmetrical elementary cells; image impedance representation; localized back-side etch process; loss 3.77 dB; membrane supported coplanar waveguide band-pass filter; micromachined coplanar waveguide band-pass filter; silicon micromachining; two-cell test structure; Band-pass filters; Coplanar waveguides; Impedance; Loss measurement; Microwave filters; Silicon; Solid modeling; band-pass filter; electromagnetic modeling; millimeter waves; silicon micromachining;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (EuMC), 2014 44th European
Conference_Location :
Rome
Type :
conf
DOI :
10.1109/EuMC.2014.6986664
Filename :
6986664
Link To Document :
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