• DocumentCode
    1768361
  • Title

    Selector devices for 3-D cross-point ReRAM

  • Author

    Euijun Cha ; Jiyong Woo ; Daeseok Lee ; Sangheon Lee ; Hyunsang Hwang

  • Author_Institution
    Pohang Univ. of Sci. & Technol. (POSTECH), Pohang, South Korea
  • fYear
    2014
  • fDate
    1-5 June 2014
  • Firstpage
    428
  • Lastpage
    431
  • Abstract
    To integrate cross-point (4F2) ReRAM device array, we need to develop bi-directional selector device to suppress the sneak current path through the unselected devices. Although various candidates with selector properties have been recently reported, several problems such as insufficient current density at set/reset operations for nano-scale devices, low selectivity, and poor endurance have been remained. In this talk, we report two types of selector devices, threshold switching device based on insulator-metal transition (IMT) and multi-layered tunneling oxide device for cross-point ReRAM application. We propose the feasibility for 3-D vertical 1S-1R type ReRAM for future ultra-high density memory applications.
  • Keywords
    metal-insulator boundaries; random-access storage; three-dimensional integrated circuits; tunnelling; 3D cross-point ReRAM device array; 3D vertical 1S-1R type ReRAM; IMT; bidirectional selector device; future ultra-high density memory applications; insulator-metal transition; multilayered tunneling oxide device; selector devices; sneak current path; threshold switching device; Arrays; Current density; Leakage currents; Resistance; Switches; Three-dimensional displays; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (ISCAS), 2014 IEEE International Symposium on
  • Conference_Location
    Melbourne VIC
  • Print_ISBN
    978-1-4799-3431-7
  • Type

    conf

  • DOI
    10.1109/ISCAS.2014.6865157
  • Filename
    6865157