DocumentCode
1769416
Title
Fabrication of subwavelngth optics using glass imprint process
Author
Nishii, Junji
Author_Institution
Res. Inst. for Electron. Sci., Hokkaido Univ., Sapporo, Japan
fYear
2014
fDate
8-13 June 2014
Firstpage
1
Lastpage
2
Abstract
Glass imprint process was developed for the fabrication of micro- and nano-structures on the surface of glasses. A spherical glass lens with two dimensional subwavelength structure exhibited the surface reflectance less than 0.2% at 530 nm in wavelength. Application of DC voltage to the mold, on the other hand, was effective to suppress the imprint temperature and pressure, which was resulted from the selective decrease in alkali concentration only in the glass surface areas contacting to the mold.
Keywords
lenses; moulding; nanolithography; optical fabrication; optical glass; soft lithography; DC voltage; alkali concentration; glass imprint process; glass surface; imprint pressure; imprint temperature; microtructure fabrication; mold; nanostructure fabrication; spherical glass lens; subwavelngth optical fabrication; surface reflectance; two-dimensional subwavelength structure; wavelength 530 nm; Fabrication; Glass; Lenses; Optical surface waves; Silicon carbide; Surface treatment; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6988321
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