DocumentCode
1769518
Title
A novel dimensional analysis method for TSV modeling and analysis in three dimensional integrated circuits
Author
Salah, Khaled ; Ismail, Yousr
Author_Institution
Mentor Graphics, Cairo, Egypt
fYear
2014
fDate
1-5 June 2014
Firstpage
2764
Lastpage
2767
Abstract
Dimensional analysis is one of the most powerful modeling methods, where it is used to reduce the number of physical variables through combining two or more variables into a single dimension neutral one in order to simplify the process of describing a relationship among those variables. That makes curve fitting to obtain final equations simpler. In this paper, dimensional analysis is applied as a new design methodology for TSV modeling. By using the dimensional analysis and the curve-fitting technique, simple formulas of TSV parameters, such as resistance, capacitance, and inductance are obtained. The results are compared with previous work that model TSVs based on measurements, where excellent agreement is obtained.
Keywords
curve fitting; integrated circuit modelling; three-dimensional integrated circuits; TSV modeling; curve fitting; dimensional analysis; three dimensional integrated circuits; Analytical models; Capacitance; Curve fitting; Integrated circuit interconnections; Integrated circuit modeling; Mathematical model; Through-silicon vias; Dimensional analysis; Modeling; TSV; Three-Dimensional ICs; Through Silicon Via;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems (ISCAS), 2014 IEEE International Symposium on
Conference_Location
Melbourne VIC
Print_ISBN
978-1-4799-3431-7
Type
conf
DOI
10.1109/ISCAS.2014.6865746
Filename
6865746
Link To Document