• DocumentCode
    1769621
  • Title

    Spin diffusion and the role of screening effects in semiconductors

  • Author

    Ghosh, Joydeb ; Sverdlov, Viktor ; Selberherr, Siegfried

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2014
  • fDate
    3-6 June 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The electron spin properties in semiconductors are of great interest because of their potential in future spin-driven microelectronic devices. We performed simulations on electron spin injection in an n-doped silicon bar from a magnetic semiconductor with spin-dependent conductivity. A variation of doping can introduce charge accumulation/depletion layer at the interface. We found substantial spin transport differences, when spins are introduced through a charge accumulated and a charge depleted interface layer. Special attention is paid to a possible spin injection efficiency enhancement compared to the existing theory at the charge neutrality condition. We found that at a fixed bulk spin polarization, the efficiency increases, if spins are injected from a charge depleted source.
  • Keywords
    doping; electrical conductivity; elemental semiconductors; ferromagnetic materials; interface magnetism; magnetic semiconductors; semiconductor doping; semiconductor heterojunctions; silicon; spin dynamics; spin polarised transport; Si; bulk spin polarization; charge accumulation; charge depleted interface layer; charge neutrality; doping; electron spin injection; electron spin properties; ferromagnetic semiconductor; n-doped silicon bar; screening effects; spin diffusion; spin transport; spin-dependent conductivity; spin-driven microelectronic devices; Current density; Doping; Electric potential; Junctions; Mathematical model; Silicon; Spin polarized transport; Spin transport; space-charge region; spin injection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics (IWCE), 2014 International Workshop on
  • Conference_Location
    Paris
  • Type

    conf

  • DOI
    10.1109/IWCE.2014.6865825
  • Filename
    6865825