DocumentCode :
1769861
Title :
Titanium nitride as a refractory plasmonic material for high temperature applications
Author :
Guler, Urcan ; Wei Li ; Boltasseva, Alexandra ; Kildishev, Alexander ; Shalaev, Vladimir M.
Author_Institution :
Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN, USA
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
1
Lastpage :
2
Abstract :
The use of titanium nitride as a plasmonic material for high temperature applications such as solar/thermophotovoltaics is studied numerically and experimentally. Performance of titanium nitride is compared with widely used materials in each field.
Keywords :
plasmonics; refractories; solar cells; thermophotovoltaic cells; titanium compounds; TiN; high temperature applications; refractory plasmonic material; solar photovoltaics; thermophotovoltaics; titanium nitride performance; Materials; Optical device fabrication; Optical imaging; Optical refraction; Plasmons; Tin; Titanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6988582
Link To Document :
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