• DocumentCode
    1769861
  • Title

    Titanium nitride as a refractory plasmonic material for high temperature applications

  • Author

    Guler, Urcan ; Wei Li ; Boltasseva, Alexandra ; Kildishev, Alexander ; Shalaev, Vladimir M.

  • Author_Institution
    Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN, USA
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The use of titanium nitride as a plasmonic material for high temperature applications such as solar/thermophotovoltaics is studied numerically and experimentally. Performance of titanium nitride is compared with widely used materials in each field.
  • Keywords
    plasmonics; refractories; solar cells; thermophotovoltaic cells; titanium compounds; TiN; high temperature applications; refractory plasmonic material; solar photovoltaics; thermophotovoltaics; titanium nitride performance; Materials; Optical device fabrication; Optical imaging; Optical refraction; Plasmons; Tin; Titanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2014 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6988582