DocumentCode :
1770610
Title :
Enhanced laser damage behavior of laser mirror by modification of the top layer design
Author :
Schiltz, Drew ; Langton, P.F. ; Patel, Dinesh ; Emmert, L. ; Acquaroli, L.N. ; Baumgarten, C. ; Reagan, B. ; Rudolph, W. ; Markosyan, A. ; Route, R.R. ; Fejer, M. ; Rocca, Jorge J. ; Menoni, C.S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
1
Lastpage :
2
Abstract :
We show the laser damage resistance of ion beam sputtered Ta2O5/SiO2 for high energy lasers can be increased by 50% when the Ta2O5 in the top few layers of the stack is replaced by HfO2 or Y2O3.
Keywords :
hafnium compounds; ion beam effects; laser beam effects; laser mirrors; optical multilayers; silicon compounds; sputtering; tantalum compounds; yttrium compounds; HfO2; Ta2O5-SiO2; Y2O3; enhanced laser damage behavior; high energy lasers; ion beam sputtering; laser damage resistance; laser mirror; stack; top layer design modification; Electric fields; Hafnium compounds; Measurement by laser beam; Mirrors; Pulsed laser deposition; Semiconductor lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6989011
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1770610
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