DocumentCode
1770634
Title
State of the art optical materials for lithographic systems for semiconductor manufacturing
Author
Takke, Ralf ; Kuehn, Bodo ; Thomas, Stephan
Author_Institution
Div. Opt., Heraeus Quarzglas GmbH & Co. KG, Hanau, Germany
fYear
2014
fDate
8-13 June 2014
Firstpage
1
Lastpage
1
Abstract
193 nm lithography has enabled semiconductor manufacturing to achieve nm resolution. Highest quality optical materials and optics are an essential part of this. Important optical properties of and test methods for these materials will be reported.
Keywords
lithography; optical materials; optical testing; semiconductors; lithographic systems; optical materials; semiconductor manufacturing; test methods; wavelength 193 nm; Lithography; Material properties; Optical materials; Optical refraction; Optical variables control;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6989025
Link To Document