Title :
Nano-patterning based on two-surface-plasmon-polariton-absorption using 400nm femtosecond laser
Author :
Yunxiang Li ; Fang Liu ; Weisi Meng ; Yidong Huang
Author_Institution :
Dept. of Electron. Eng., Tsinghua Univ., Beijing, China
Abstract :
Nano-patterning with linewidth of ~55 nm is demonstrated utilizing two-surface-plasmon-polariton-absorption (TSPPA) at the wavelength of 400 nm. The SPP field generated by plasmonic microlens is recorded by the TSPPA showing a new way for recording the SPP field in micro/nano structures.
Keywords :
aluminium; high-speed optical techniques; metallic thin films; microlenses; nanolithography; nanopatterning; photoresists; polaritons; surface plasmons; Al; femtosecond laser; microstructures; nanopatterning; nanostructures; plasmonic microlens; spectral linewidth; two-surface-plasmon-polariton-absorption; wavelength 400 nm; Absorption; Interference; Lenses; Lithography; Plasmons; Resists; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location :
San Jose, CA
