The characteristic of GZO thin film deposited on flexible substrates by using RF magnetron sputtering

Author

TaoHsing Chen ; Chia-Ching Chiang ; Ting-You Chen

Author_Institution

Dept. of Mech. Eng., Nat. Kaohsiung Univ. of Appl. Sci., Kaohsiung, Taiwan

fYear

2014

fDate

2-4 July 2014

Firstpage

199

Lastpage

202

Abstract

In this study, we investigate the optical and electrical properties of ZnO:Ga (GZO) films on polyimide flexible substrates by using radio frequency magnetron sputtering(RF-sputtering). The structural, electric and optical characteristics of GZO thin films with various deposition parameters were investigated. All films illustrate strong (002) for GZO preferential orientation by using XRD analysis. The results show that the optical transmittance of GZO thin film exhibited an excellent transparency in the visible light field. Moreover, the resistivity of GZO decrease with increasing deposited time.

Keywords

II-VI semiconductors; X-ray diffraction; electrical resistivity; gallium; semiconductor growth; semiconductor thin films; sputter deposition; transparency; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; RF magnetron sputtering; XRD; ZnO:Ga; deposition parameters; electrical properties; electrical resistivity; optical properties; optical transmittance; polyimide flexible substrates; preferential orientation; radiofrequency magnetron sputtering; structural characteristics; thin film; transparency; visible light field; Conductivity; Magnetic films; Optical films; Radio frequency; Sputtering; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2014 21st International Workshop on

Conference_Location

Kyoto

Type

conf

DOI

10.1109/AM-FPD.2014.6867170

Filename

6867170